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Global Algae Summit 2023

Global Algae Summit 2023
17th August 2023
9:00 am – 18:00 pm
UTM Kuala Lumpur

Calling all Distinguished Academia, Researchers, Entrepreneurs, Policymakers, Industry Leaders, and Algae Industry Experts!

Join us at the Global Algae Summit 2023, where we invite you to share your invaluable insights. This prestigious event brings together visionaries from around the world to explore the latest advancements and opportunities in the field of algae.

Be part of this vibrant gathering as we foster collaborations, exchange knowledge, and drive innovation in the Algae Industry. Don’t miss out on the chance to network with like-minded professionals and contribute to shaping a sustainable future.

Mark your calendars for the Global Algae Summit 2023 and secure your spot among the brightest minds in the industry. Together, let’s propel the Algae Industry forward and unlock its immense potential!

Date: 17th August 2023 (Thursday)
Time: 9:00 am – 18:00 pm
Link: https://global.lne.st/gas2023/
Venue: Azman Hashim Hall, UTM Kuala Lumpur
Fee: Free of Charge (participant & poster presenters)

Register now and be at the forefront of the Algae Industry Revolution!

Best Regards,

GAS 2023 Organising team

MJIIT and UTM Strengthen Ties with Japan and South East Asia’s Industry-Academia-Government Consortium

MJIIT and UTM Strengthen Ties with Japan and South East Asia’s Industry-Academia-Government Consortium

Japan, 6 December – As Advisory Members, Universiti Teknologi Malaysia (UTM) and Malaysia-Japan International Institute of Technology (MJIIT) attended the Global Technology Initiative (GTI) Consortium Symposium on 6th December 2019 at Shibaura Institute of Technology (SIT), Japan. GTI is an industry-academia-government collaboration comprising of 218 member institutions including industry, corporations and associations, learning institutions, and government organisations in Japan and South East Asia. The symposium featured special speeches from its member representatives, including Mr. Alexandre Riesterer, Director and Executive Vice President of Bosch Corporation, Japan, and Dr. Hiroshi Fujiwara, Chairman and President, and Chief Executive Officer of the Internet Association Japan and BroadBand Tower, Inc, Japan.

UTM and MJIIT have been participating in GTI activities since the establishment of the alliance in December 2015. In addition to international projects between learning institutions, the consortium also focuses on inter-governmental projects, allowing allied universities to take part in national aid projects based on intergovernmental agreements and international joint research projects. Through its global internship, it presents student opportunities for an internship at firms and factories overseas to experience cultural diversity and gain an understanding of different approaches to problem solving. In its Global Project Based Learning, students from member universities form international teams to put forward proposals and present ideas to solve challenging technical issues, with mentorship from university faculty members, authorities working at member companies and government agencies.

In the opening ceremony of the symposium, Prof Dr. Masato Murakami, President of SIT, emphasized the need for a new generation of engineers who can function in global teams, appreciating and respecting professional and cultural diversity. GTI will be a platform where global industries and universities in Japan and the world in cooperation with government agencies collaborate to nurture global engineers and to bring technological innovation, and thus to strengthen international competitiveness in the engineering field. The consortium aims to foster global human resources, drive innovation for global sustainability, Quality Assurance of higher education in STEM fields, and enhance industry competitiveness.

Universiti Teknologi Malaysia was represented by Dean of Faculty of Engineering, Prof Dato’ Ir. Dr. Mohammed Rafiq Abdul Kadir, Dean of Malaysia-Japan International Institute of Technology, Prof Dr. Ali Selamat, and Manager (International Alliances), UTM International, Dr. Farhana Diana Deris.

Academic Staff : Koichiro Mashiko

Prof Koichiro Mashiko
PhD (Osaka University, Japan)
Electronic Systems Engineering Department

Email: k.mashiko@utm.my
Tel:03 2203 1307
Research Interests
  • Embedded System Design with emphasis on Mixed-Signal Design
  • Design Methodology of LSI Chips and Systems
  • Device Physics with emphasis on Memories
Previous Position
  • April/1/2009 – Marcg/31/2015: General Manager and Director of Kobe Design Center, A-R-Tec Corp., Higashi-Hiroshima, Japan
  • April/1/2008 – March/31/2009: Senior Manager, Planning of R&D, Renesas Technology, Inc. Itami Japan
  • September/5/2002 – March/31/2008: Senior Researcher,  STARC    (Semiconductor Technology Academic Research Center), Yokohama, Japan
  • July/16/1993 – September/1/2002: Manager, Novel Circuit Architecture Group,  Mitsubishi Electric Corp. Itami, Japan.
  • August/25/1990 – July/15/1993: Research Staff, Mitsubishi Electric Research Laboratories, Cambridge, U.S.A
  • April/1/1977 – August/15/1990: Researcher, Mitsubishi Electric LSI Development Center, Itami, Japan
  • Fifth Generation Computer Project (1988-1990)    (ICOT: Institute for new generation computer technology)      Sub Theme: “PSI(Personal Sequential Inference Machine)
  • b)  Dream-Chip Project (2010-2011)   (ASET: Association of Super-Advanced Electronics Technology)    Sub Theme: “Ultra-wide Bus SiP 3D Integration Technology
Activities Chairman/Committee Member

  • 1994-1998:    Program Committee @ IEEE VLSI Circuit Symposium
  • 1999-2002:    Technical Committee @ IEEE CICC
  • 2001-2002:    Voting Member @IEEE 802.3ae Committee(10Giga Ethernet)
  • 2003-2005:    Topic Chairman and Program Committee @ IEEE ASP-DAC
  • 2002-2009:    Program Committee @ IEEE VLSI-DAT(Taiwan)
  • 2006-2009:    Program Committee @ IEEE A-SSCC
  • 1988:    IR100 Award(256Kb Dual Port RAM)
  • 1997:    R&D100 Award(1.9GHz IF Cordless Transceiver)
  • 2000:    R&D100Award(2.5Gbps 0.18um SOI-CMOS Mux/Demux)
Selected Publications a) Keynote/Invited

  1. Invited Talk:  How to Design Low-Power Digital Cellular Phones
    K. Mashiko @International Symp. on Low Power Electronics and Devices pp.177-180, Aug-96.
  2. Invited Talk: “Challenge and opportunity in analog and RF electronics,”
    K. Mashiko @ASICON 2005. 6th Int. Conf. on ASICs, Volume 1,
    pp.1205-1209, Oct-05.
  3. Panelist @ ISSCC1987 Evening Discussion “DRAM Cell Structures and Technologies”, Feb-87.
  4. Panelist @ ISSCC1998 Evening Discussion  “Deep Sub 1V, SOI or Bulk CMOS?”, Feb-98.
  5. Organizer of Panel Discussion @ IEEE AP-ASIC   “Academia/industry collaboration in SOC design education: Wishes and reality.”, June-04.

b) Journal
International Referred Journal

  1. K. Mashiko, T. Kobayashi, H. Miyamoto, K. Arimoto, Y. Morooka,
    M. Hatanaka, M. Yamada and T. Nakano, “A 70ns 256K DRAM with Bit-Line
    Shield,”  IEEE Journal of Solid-State Circuits, Vol.SC-19, No.5, pp.591-596,
  2. K. Mashiko, M. Ngamoto, K. Arimoto, Y. Matsuda, K. Furutani, T. Matsukawa,
    T. Yoshihara and T. Nakano, “A 4-Mbit DRAM with Folded-Bitline Adaptive Sidewall-Isolated Capacitor (FASIC) Cell,”  IEEE Journal of Solid-State Circuits, Vol.SC-22, No.5, pp.643-650, Oct-87.
  3. T. Nakura, K. Ueda, K. Kubo, Y. Matsuda, K. Mashiko and T. Yoshihara,
    “A 3.6-Gb/s 340-mW 16:1 Pipe-Lined Multiplexer using 0.18 μm SOI-CMOS Technology,” IEEE Journal of Solid-State Circuits, Vol.35, NO.5, pp.751-756, May-00.
  4. S. Maeda, Y. Wada, K. Yamamoto, H. Komurasaki, T. Matsumoto, Y. Hirano,
    T. Iwamatsu, Y. Yamaguchi, T. Ipposhi, K. Ueda, K. Mashiko, S. Maegawa and M. Inuishi, “Feasibility of 0.18 μm SOI CMOS Technology Using Hybrid Trenh Isolation with High Resistivity Substrate for Embedded RF/Analog Applications,” IEEE Transactions on Electron Devices, Vol.48, No.9, pp.2065-2073, Sep-01.
    (and about 20 papers more)

Other Journal

  1. K. Mashiko, K. Ueda, T. Yoshimura, T. Hirota, Y. Wada, J. Takasoh and K. Kubo, “Ultra Low Power Operation of Partially-Depleted SOI/CMOS Integrated Circuits, “IEICE Trans. Electron, Vol.E-83-C, No.11, pp.1697-1704, Nov-00.
  2. Y. Yamaguchi, T. Ipposhi, K. Ueda, K. Mashiko, S. Maegawa, M. Inuishi and T. Nishimura, “Partially Depleted SOI Technology with Body-Tied Hybrid Trench Isolation for High-Speed System-On-a-Chip Application,”  IEICE Trans. Electron, Vol.E84-C, N0.12, pp.1735-1745, Dec-01.
  3. H. SAN, A. HAYAKAWA, Y. JINGU, H. WADA, H. HAGIWARA, K. KOBAYASHI, H. KOBAYASHI, T. MATSUURA, K. YAHAGI, J. KUDOH, H. NAKANE, M. HOTTA, T. TSUKADA, K. MASHIKO, and A. WADA, “Complex Bandpass ΔΣAD Modulator Architecture without I, Q-Path Crossing Layout IEICE Trans Fundamentals, Vol.E89-A, No.4, pp.908-915, Apr-06.

(and about 20 papers more)

c) Book/Book Chapter

  1. 1  “Neuro-computer Engineering” Chapter 5, Kogyo Chousakai, 1992.
    2  “System LSI: Application and Technology”, Chapter 8、Science Forum, 2000.
    3 ”Digital Systems Engineering (translation)”, Chapter 1,2,4, Maruzen, 2003.
    Original: “Digital Systems Engineering;” by William J. Dally & John W. Poulton)

d) Proceedings of International Conference

  1. K. Mashiko, T. Kobayashi, W. Wakamiya, M. Hatanaka and M. Yamada, “A 70ns 256K DRAM with Bitline Shielding Structure,” ISSCC Dig. Tech. Papers, pp.98-99, Feb-84.
  2. K. Mashiko, Y. Morooka, K. Yasuda, T. Kobayashi, M. Yamada and T. Nakano, “A CMOS Dual Port Memory with Serial Read/Write Function for Graphic Systems,” IEEE Transactions on Consumer Electronics, Vol.CE-32, No.3, pp.636-643, Aug-86.
  3. K. Arimoto, T. Yamagata, H. Miyamoto, K. Mashiko, M. Yamada, S. Sato and H. Shibata, “AN EFFECT OF FILLER-INDUCED-STRESS TO DRAM SENSE AMPLIFIER,” VLSI Symposium Dig. Technical Papers, pp.92-93, Jun-85.
  4. K. Mashiko, M. Nagatomo, K. Arimoto, Y. Matsuda, K. Furutani, T. Matsukawa, T. Yoshihara and T. Nakano, “A 90ns 4Mb DRAM in a 300mil DIP,” ISSCC Dig. Tech. Papers, pp.12-13, Feb-87.
    (and more than 22 papers more)