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Spin Coater | Nanofabrication Laboratory

Spin Coater

Model: Kyowa Riken K-359SD1

The spin coater unit is capable for low to high speed rotation, from 50 to 7,000 rpm at high accuracy of ± 0.2%/3000 rpm. It handles up to three steps of coating, custom defined by the user at desired rotation speed and time from 0 to 999 sec. The stage support sample from several mm2 up to 6 inch wafer. Commonly used but not limited to resist coating, it also helpful for obtaining thin film of sol-gel and similar material.