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Reactive Ion Etching | Nanofabrication Laboratory

Reactive Ion Etching

Name Reactive Ion Etching System
Model ES301
Description Reactive ion Etching System ES301 has a temperature controlling system on the stage and an original specimen setting method, which always provide the stable etching rate.

Excellent repeatability at the stable etching rate.

Specific etching is available in an isotropic or anisotropic mode

Automatic matching