RF Magnetron Sputtering

Name RF Magnetron Sputtering
Model Kurt J Lesker LAB Line Sputter 5
Description This is an thin film deposition system purpose built for magnetron sputtering deposition applications

Applications:

·        R&D Sputter Deposition

·        Microelectronics (Metals, metal oxides, dielectrics)

·        Data Storage (Magnetics thin films)

·        MEMS and Nano Technology

·        Superconducting Materials

·        Josephson Junctions

·        Biomedical Thin Films

·        Photovoltaics

·        Optical Films and Photonics

Target dimension: 3 inches (3mm thickness)

Available target: high purity SiO2, Si3N4